
Metal surface treatment is a foundational technology in manufacturing, with its objectives expanding from traditional corrosion and wear resistance to high-end applications such as enhancing optical, electrical, and biocompatible properties. With the expl
Time:2025-09-23
In the precision-driven world of semiconductor manufacturing, the Showerhead (also known as a gas distribution plate or spray head) serves as the core component of gas distribution systems. Its performance directly determines the uniformity of thin-film d
Time:2025-09-23
In the complex process of semiconductor manufacturing, gas channel design technology is akin to a sophisticated vascular system, precisely and uniformly delivering reactive gases to the surface of wafers. It directly impacts the quality of thin - film dep
Time:2025-09-23
In the microscopic world of semiconductor manufacturing, the Showerhead (also known as a spray shower or gas distribution plate) acts like a precise gas conductor. Through its surface featuring tens of thousands of micro-hole arrays, it evenly sprays reac
Time:2025-09-23
Micropore processing technology, as one of the core technologies in precision manufacturing, finds widespread applications across multiple high-tech industries, including semiconductors, aerospace, healthcare, and electronics. With continuous technologica
Time:2025-09-23
In the field of semiconductor manufacturing, the Showerhead (spray head/gas distribution plate), as a core component of the gas distribution system, directly determines the uniformity of thin-film deposition on wafer surfaces, etching precision, and the s
Time:2025-09-23
IntroductionIn the extreme environment of semiconductor manufacturing, Showerheads must withstand temperatures exceeding 600C, plasma bombardment, and erosion from corrosive gases (e.g., Cl₂, BCl₃). Surface treatment technologies not only determine their…
Time:2025-09-12
In the microscopic realm of semiconductor manufacturing, the Showerhead (gas distribution plate) serves as a critical component for uniform gas delivery, directly influencing film uniformity, step coverage, and particle defect density on wafers. With brea
Time:2025-09-12
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