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Atomic Layer Deposition (ALD) and Showerhead

I. Alignment between Core Advantages of ALD Technology and Performance Requirements of ShowerheadAtomic Layer Deposition (ALD), a thin-film deposition technology based on self-limiting surface reactions, exhibits unique advantages that are highly compatib

Time:2025-07-28

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Atomic Layer Deposition (ALD) in the Semiconductor Industry

In the semiconductor manufacturing sector, as device dimensions continue to shrink, unprecedented challenges have been posed to thin-film deposition technologies. Atomic Layer Deposition (ALD), a thin-film deposition technique capable of achieving atomic-

Time:2025-07-28

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Etching Process in Semiconductor Manufacturing(Showerhead)

Etching is a crucial step following photolithography, where the pattern on the photoresist is precisely transferred to the underlying thin - film material. It is one of the core processes for realizing integrated circuit structures on a wafer. The quality

Time:2025-07-28

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Analysis of the Relationship Between Dry Etching and Showerhead

I. Core Principles and Process Requirements of Dry EtchingDry etching removes materials through plasma or high-energy ion beams, with the following core principles:1. Physical Bombardment: Ions are accelerated by an electric field to strike the wafer surf

Time:2025-07-28

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Simultaneous Enhancement of Particle Control and Operational Durability

I. Showerhead: A Core Precision Component in Semiconductor Manufacturing 1. Core Functions of ShowerheadShowerheads (gas distribution plates) are critical components in semiconductor equipment, primarily used in cleaning, etching, and deposition processes

Time:2025-07-09

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The Co-evolution of High-Precision Showerhead Manufacturing and Semiconductor Processes

I. Showerhead: The "Gas Distribution Hub" in Semiconductor ProcessesCore FunctionsUniform Gas Distribution: Through densely distributed micropores (diameter: 0.2–6 mm), etch/deposition gases are uniformly sprayed onto the wafer surface to avoid

Time:2025-07-08

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Showerhead Flow Control: Reducing Hard Ion Collisions and Minimizing Lattice Damage

Full English Translation with Technical Context Ion Implantation: A Physical Process for Precision DopingIon implantation is a critical technique for introducing controllable impurities into semiconductor substrates through a purely physical process, alte

Time:2025-07-07

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The semiconductor Showerhead

The semiconductor Showerhead, with its Chinese names being spray head, gas distribution plate, or uniform gas distribution plate, serves as a core component in semiconductor manufacturing equipment and plays a crucial role in the semiconductor production

Time:2025-07-02

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